RAPID
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An
equipment and vacuum-plasma methods of coating deposition
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A scientific-technical service centre "Rapid" is engaged
in research and development of the equipment and technologies of a
plasma-arc evaporation and DC magnetron sputtering in vacuum of different
electric-conductive materials with a subsequent deposition of a vapor
phase in direct or reactive mode onto metallic and dielectric substrates
("dry galvanic").
Special features of the methods:
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a possibility to deposit pure metals (Ni, Cr, Ti,
Cu, Al, Sn, Mo, etc.) and their alloys with a garanteed good adhesion
of coatins to the article surfaces;
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a possibility to deposit two or tree-layered coatings;
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a process is two times less power-intensive as
a galvanic one;
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a process is ecologically safe, does not require
a usage of toxic matters, excludes from a use of purification works,
improves work conditions.
 Ion-plasma
coatings are high-densed and have a high wear- and corrosion- resistance.
E.g. Ni and Cr coatings of a 15 mkm thickness substitute electroplate
coatings of 40...50 mkm thickness. Metallization may be done onto outside/inside
( > 100mm in diameter in the latter case) surfaces of required articles
and long- sized workpieces.
 STSC
"Rapid" has developed industrial type ion-plasma BY-1000 and BI-1200
installations with vacuum working chambers of 1000...1200 mm in diameter
and 1400...2000 mm in height. These universal installations are equiped
with a specified number of planar-type and cylinder-type evaporators
according to different production requirements. Installations are designed
to deposit protective, decorative, wear-resistant, tribotechnical and
other types of functional coatings onto articles made of glass, porcelain,
plastic, ceramics and metal. Developed gas-plasma generators allow to
increase substantially an ion- yield coefficient of the vapor flow in
order to clean and activate more effectively the surface of treated
parts before coating deposition and produce high-adhesive layers with
a fine-grained structure. |
